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    Numerical and Experimental Study on Metal Organic Vapor-Phase Epitaxy of InGaN∕GaN Multi-Quantum-Wells

    Source: Journal of Fluids Engineering:;2008:;volume( 130 ):;issue: 008::page 81601
    Author:
    Changsung Sean Kim
    ,
    Jongpa Hong
    ,
    Jihye Shim
    ,
    Bum Joon Kim
    ,
    Hak-Hwan Kim
    ,
    Sang Duk Yoo
    ,
    Won Shin Lee
    DOI: 10.1115/1.2956513
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: A numerical and experimental study has been performed to characterize the metal organic vapor-phase epitaxy (MOVPE) growth of InGaN∕GaN multi-quantum-wells. One of the major objectives of the present study is to predict the optimal operating conditions that would be suitable for the fabrication of GaN-based light-emitting diodes using three different reactors, vertical, horizontal, and planetary. Computational fluid dynamics (CFD) simulations considering gas-phase chemical reactions and surface chemistry were carried out and compared with experimental measurements. Through a lot of CFD simulations, the database for the multiparametric dependency of indium incorporation and growth rate in InGaN∕GaN layers has been established in a wide range of growth conditions. Also, a heating system using radio frequency power was verified to obtain the uniform temperature distribution by simulating the electromagnetic field as well as gas flow fields. The present multidisciplinary approach has been applied to the development of a novel-concept MOVPE system as well as performance enhancement of existing commercial reactors.
    keyword(s): Vapors , Metals , Wells , Semiconductor wafers , Epitaxy , Surface science , Temperature , Modeling , Temperature distribution , Heating , Indium gallium nitride , Light-emitting diodes , Computational fluid dynamics , Engineering simulation , Equations , Measurement , Gallium nitride , Rotation , Electromagnetic induction AND Databases ,
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      Numerical and Experimental Study on Metal Organic Vapor-Phase Epitaxy of InGaN∕GaN Multi-Quantum-Wells

    URI
    https://yetl.yabesh.ir/yetl1/handle/yetl/138185
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    • Journal of Fluids Engineering

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    contributor authorChangsung Sean Kim
    contributor authorJongpa Hong
    contributor authorJihye Shim
    contributor authorBum Joon Kim
    contributor authorHak-Hwan Kim
    contributor authorSang Duk Yoo
    contributor authorWon Shin Lee
    date accessioned2017-05-09T00:28:21Z
    date available2017-05-09T00:28:21Z
    date copyrightAugust, 2008
    date issued2008
    identifier issn0098-2202
    identifier otherJFEGA4-27329#081601_1.pdf
    identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/138185
    description abstractA numerical and experimental study has been performed to characterize the metal organic vapor-phase epitaxy (MOVPE) growth of InGaN∕GaN multi-quantum-wells. One of the major objectives of the present study is to predict the optimal operating conditions that would be suitable for the fabrication of GaN-based light-emitting diodes using three different reactors, vertical, horizontal, and planetary. Computational fluid dynamics (CFD) simulations considering gas-phase chemical reactions and surface chemistry were carried out and compared with experimental measurements. Through a lot of CFD simulations, the database for the multiparametric dependency of indium incorporation and growth rate in InGaN∕GaN layers has been established in a wide range of growth conditions. Also, a heating system using radio frequency power was verified to obtain the uniform temperature distribution by simulating the electromagnetic field as well as gas flow fields. The present multidisciplinary approach has been applied to the development of a novel-concept MOVPE system as well as performance enhancement of existing commercial reactors.
    publisherThe American Society of Mechanical Engineers (ASME)
    titleNumerical and Experimental Study on Metal Organic Vapor-Phase Epitaxy of InGaN∕GaN Multi-Quantum-Wells
    typeJournal Paper
    journal volume130
    journal issue8
    journal titleJournal of Fluids Engineering
    identifier doi10.1115/1.2956513
    journal fristpage81601
    identifier eissn1528-901X
    keywordsVapors
    keywordsMetals
    keywordsWells
    keywordsSemiconductor wafers
    keywordsEpitaxy
    keywordsSurface science
    keywordsTemperature
    keywordsModeling
    keywordsTemperature distribution
    keywordsHeating
    keywordsIndium gallium nitride
    keywordsLight-emitting diodes
    keywordsComputational fluid dynamics
    keywordsEngineering simulation
    keywordsEquations
    keywordsMeasurement
    keywordsGallium nitride
    keywordsRotation
    keywordsElectromagnetic induction AND Databases
    treeJournal of Fluids Engineering:;2008:;volume( 130 ):;issue: 008
    contenttypeFulltext
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