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contributor authorM. Toulemonde
contributor authorJ. C. Muller
contributor authorB. Stuck
date accessioned2017-05-08T23:23:23Z
date available2017-05-08T23:23:23Z
date copyrightMay, 1986
date issued1986
identifier issn0199-6231
identifier otherJSEEDO-28189#102_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/101647
description abstractA new method is proposed for preparing silicon P -N junctions. The first consists in fixing a transparent plastic film coated with a thin layer of a conventional dopant on the surface of the wafer, then illuminating this sandwich with a higher power Q switched laser. Two successive pulses are used, the first being able to transfer the dopant from the film to the silicon surface, the second to induce a liquid phase diffusion incorporating the dopant into the silicon lattice. Solar cells have been prepared by using this process, implying several attractive features.
publisherThe American Society of Mechanical Engineers (ASME)
titleTransfer of a Metal From a Transparent Film to the Surface of Silicon to Produce P-N Junction Solar Cells
typeJournal Paper
journal volume108
journal issue2
journal titleJournal of Solar Energy Engineering
identifier doi10.1115/1.3268074
journal fristpage102
journal lastpage104
identifier eissn1528-8986
keywordsMetals
keywordsJunctions
keywordsSilicon
keywordsSolar cells
keywordsTransparency
keywordsLasers
keywordsSemiconductor wafers
keywordsPlastic films AND Diffusion (Physics)
treeJournal of Solar Energy Engineering:;1986:;volume( 108 ):;issue: 002
contenttypeFulltext


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