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dc.contributor.authorLee, Hyoungsoon
dc.contributor.authorMaitra, Tanmoy
dc.contributor.authorPalko, James
dc.contributor.authorKong, Daeyoung
dc.contributor.authorZhang, Chi
dc.contributor.authorBarako, Michael T.
dc.contributor.authorWon, Yoonjin
dc.contributor.authorAsheghi, Mehdi
dc.contributor.authorGoodson, Kenneth E.
dc.date.accessioned2019-02-28T11:14:16Z
dc.date.available2019-02-28T11:14:16Z
dc.date.copyright5/9/2018 12:00:00 AM
dc.date.issued2018
dc.identifier.issn1043-7398
dc.identifier.otherep_140_02_020906.pdf
dc.identifier.urihttp://yetl.yabesh.ir/yetl1/handle/yetl/4254162
dc.description.abstractEnhanced boiling is one of the popular cooling schemes in thermal management due to its superior heat transfer characteristics. This study demonstrates the ability of copper inverse opal (CIO) porous structures to enhance pool boiling performance using a thin CIO film with a thickness of ∼10 μm and pore diameter of 5 μm. The microfabricated CIO film increases microscale surface roughness that in turn leads to more active nucleation sites thus improved boiling performance parameters such as heat transfer coefficient (HTC) and critical heat flux (CHF) compared to those of smooth Si surfaces. The experimental results for CIO film show a maximum CHF of 225 W/cm2 (at 16.2 °C superheat) or about three times higher than that of smooth Si surface (80 W/cm2 at 21.6 °C superheat). Optical images showing bubble formation on the microporous copper surface are captured to provide detailed information of bubble departure diameter and frequency.
dc.publisherThe American Society of Mechanical Engineers (ASME)
dc.titleEnhanced Heat Transfer Using Microporous Copper Inverse Opals
dc.typeJournal Paper
dc.journal.volume140
dc.journal.issue2
dc.journal.titleJournal of Electronic Packaging
dc.identifier.doi10.1115/1.4040088
dc.journal.fristpage20906
dc.journal.lastpage020906-6
dc.treeJournal of Electronic Packaging:;2018:;volume( 140 ):;issue: 002
dc.contenttypeFulltext


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