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    Three-Dimensional Compatible Sacrificial Nanoimprint Lithography for Tuning the Wettability of Thermoplastic Materials

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    Date
    2018
    Author
    Hasan, Molla
    Shajahan, Imrhankhan
    Gopinadhan, Manesh
    Ketkaew, Jittisa
    Anesgart, Aaron
    Cho, Chloe
    Chopra, Saransh
    Higgins, Michael
    Reyes, Saira
    Schroers, Jan
    Osuji, Chinedum O.
    Singer, Jonathan P.
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    Abstract
    We report the tuning of surface wetting through sacrificial nanoimprint lithography (SNIL). In this process, grown ZnO nanomaterials are transferred by imprint into a metallic glass (MG) and an elastomeric material, and then etched to impart controlled surface roughness. This process increases the hydrophilicity and hydrophobicity of both surfaces, the Pt57.5Cu14.7Ni5.3P22.5 MG and thermoplastic elastomer (TPE), respectively. The growth conditions of the ZnO change the characteristic length scale of the roughness, which in turn alters the properties of the patterned surface. The novelty of this approach includes reusability of templates and that it is able to create superhydrophilic and superhydrophobic surfaces in a manner compatible with the fabrication of macroscopic three-dimensional (3D) parts. Because the wettability is achieved by only modifying topography, without using any chemical surface modifiers, the prepared surfaces are relatively more durable.
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    http://yetl.yabesh.ir/yetl1/handle/yetl/4252507
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