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dc.contributor.authorAizawa, T.
dc.contributor.authorSuga, H.
dc.contributor.authorNagata, T.
dc.contributor.authorYamaguchi, T.
dc.date.accessioned2017-11-25T07:18:37Z
dc.date.available2017-11-25T07:18:37Z
dc.date.copyright2017/23/3
dc.date.issued2017
dc.identifier.issn2166-0468
dc.identifier.otherjmnm_005_02_021004.pdf
dc.identifier.urihttp://138.201.223.254:8080/yetl1/handle/yetl/4235279
dc.description.abstractThe initial microdot and microline patterns were first ink-jet printed onto the surface of polished AISI420 stainless steel mold. This masked mold substrate was nitrided at 693 K for 7.2 ks at 70 Pa by using the high-density plasma nitriding system. The unmasked parts were selectively nitrided to have higher hardness than 1200 HV. This hardness-profiled substrate was mechanically sand-blasted to fabricate the microtextured mold. Microdisk patterned plastic cover-case for cellular phones were injection-molded by using this method for practical demonstration. Both the selective hardening and anisotropic inner nitriding processes were experimentally discussed as a key step in the present processing.
dc.publisherThe American Society of Mechanical Engineers (ASME)
dc.titleMicrotexturing Into AISI-SUS420 Molds for Injection Molding Via Plasma Nitriding
dc.typeJournal Paper
dc.journal.volume5
dc.journal.issue2
dc.journal.titleJournal of Micro and Nano-Manufacturing
dc.identifier.doi10.1115/1.4035953
dc.journal.fristpage21004
dc.journal.lastpage021004-8
dc.treeJournal of Micro and Nano-Manufacturing:;2017:;volume( 005 ):;issue: 002
dc.contenttypeFulltext


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