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dc.contributor.authorJ. M. Bradford
dc.contributor.authorV. Nagpal
dc.date.accessioned2017-05-09T01:36:26Z
dc.date.available2017-05-09T01:36:26Z
dc.date.copyrightJuly, 1973
dc.date.issued1973
dc.identifier.issn0094-4289
dc.identifier.otherJEMTA8-26833#170_1.pdf
dc.identifier.urihttp://yetl.yabesh.ir/yetl/handle/yetl/163817
dc.description.abstractAn investigation was made of the effect of cleaning the contacting surfaces of copper samples upon the strength of the diffusion bond formed. The cleaning of surfaces by filing and the diffusion bonding were carried out in high vacuum. Results showed that the bond formed between samples cleaned by filing was greater than the bond formed by samples that were not cleaned prior to bonding. An analysis is made of the data to show that the activation energy of the bonding process is much less than the activation energy of bulk self diffusion of copper.
dc.publisherThe American Society of Mechanical Engineers (ASME)
dc.titleEffect of Surface Contamination on the Diffusion Bonding of Copper
dc.typeJournal Paper
dc.journal.volume95
dc.journal.issue3
dc.journal.titleJournal of Engineering Materials and Technology
dc.identifier.doi10.1115/1.3443145
dc.journal.fristpage170
dc.journal.lastpage173
dc.identifier.eissn1528-8889
dc.keywordsCopper
dc.keywordsDiffusion bonding (Metals)
dc.keywordsContamination
dc.keywordsDiffusion (Physics)
dc.keywordsBonding AND Vacuum
dc.treeJournal of Engineering Materials and Technology:;1973:;volume( 095 ):;issue: 003
dc.contenttypeFulltext


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