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dc.contributor.authorEllen Ivers-Tiffée
dc.contributor.authorUwe Guntow
dc.contributor.authorJohannes Ernst
dc.contributor.authorCornelia Endler-Schuck
dc.contributor.authorAndré Weber
dc.contributor.authorJürgen Ruska
dc.date.accessioned2017-05-09T00:44:36Z
dc.date.available2017-05-09T00:44:36Z
dc.date.copyrightAugust, 2011
dc.date.issued2011
dc.identifier.issn2381-6872
dc.identifier.otherJFCSAU-28949#041001_1.pdf
dc.identifier.urihttp://yetl.yabesh.ir/yetl/handle/yetl/146455
dc.description.abstractGd2O3-doped ceria (GCO) is irreplaceable as interface/buffer layer between a mixed conducting cathode such as La0.58Sr0.4Co0.2Fe0.8O3-δ (LSCF) and an 8 mol %Y2O3 stabilized ZrO2 (8YSZ) thin film electrolyte. To meet the demands of high performance, indispensable characteristics of this interface (LSCF/GCO/8YSZ) are (i) no reaction of GCO with LSCF or YSZ and (ii) a GCO layer that is defect-free (closed porosity, no cracks). It is well known that state-of-the-art screen printed and sintered GCO buffer layers are imperfect and ultimately reduce the overall performance. This study concentrates on the evaluation of nanoscaled GCO thin films integrated into anode supported cells (ASC). GCO thin films were deposited on 8YSZ electrolyte by a low temperature metal organic deposition (MOD) process. MOD is preferable because it is a versatile technique for large scale and low cost fabrication for various material compositions. The authors investigated the influence of preparation parameters with respect to chemical homogeneity and film quality (pores, cracks) of GCO thin films with a constant film thickness between 50 nm and 100 nm. Electrochemical performance of anode supported cells employing MOD derived GCO thin films will be presented in terms of ohmic resistance (ASRΩ) and will be evaluated in contrast to screen printed and sintered GCO thick films. Nanoscale MOD derived thin films with low processing temperatures and dense film qualities were vastly superior to state-of-the-art GCO and beneficial to the overall cell performance.
dc.publisherThe American Society of Mechanical Engineers (ASME)
dc.titleNanoscale Gd-Doped CeO2 Buffer Layer for a High Performance Solid Oxide Fuel Cell
dc.typeJournal Paper
dc.journal.volume8
dc.journal.issue4
dc.journal.titleJournal of Fuel Cell Science and Technology
dc.identifier.doi10.1115/1.4003016
dc.journal.fristpage41001
dc.identifier.eissn2381-6910
dc.keywordsAnodes
dc.keywordsCoatings
dc.keywordsElectrical resistance
dc.keywordsPolishing equipment
dc.keywordsNanoscale phenomena
dc.keywordsSolid oxide fuel cells
dc.keywordsElectrolytes
dc.keywordsThin films
dc.keywordsTemperature
dc.keywordsCoating processes
dc.keywordsFracture (Materials)
dc.keywordsFilm thickness
dc.keywordsPorosity AND Metals
dc.treeJournal of Fuel Cell Science and Technology:;2011:;volume( 008 ):;issue: 004
dc.contenttypeFulltext


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