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dc.contributor.authorC. Basaran
dc.contributor.authorD. Frear
dc.contributor.authorJ. K. Lin
dc.contributor.authorH. Ye
dc.contributor.authorD. C. Hopkins
dc.date.accessioned2017-05-09T00:15:53Z
dc.date.available2017-05-09T00:15:53Z
dc.date.copyrightJune, 2005
dc.date.issued2005
dc.identifier.issn1528-9044
dc.identifier.otherJEPAE4-26243#157_1.pdf
dc.identifier.urihttp://yetl.yabesh.ir/yetl/handle/yetl/131655
dc.description.abstractThe failure modes of flip chip solder joints under high electrical current density are studied experimentally. Three different failure modes are reported. Only one of the failure modes is caused by the combined effect of electromigration and thermomigration, where void nucleation and growth contribute to the ultimate failure of the module. The Ni under bump metallization–solder joint interface is found to be the favorite site for void nucleation and growth. The effect of pre-existing voids on the failure mechanism of a solder joint is also investigated
dc.publisherThe American Society of Mechanical Engineers (ASME)
dc.titleFailure Modes of Flip Chip Solder Joints Under High Electric Current Density
dc.typeJournal Paper
dc.journal.volume127
dc.journal.issue2
dc.journal.titleJournal of Electronic Packaging
dc.identifier.doi10.1115/1.1898338
dc.journal.fristpage157
dc.journal.lastpage163
dc.identifier.eissn1043-7398
dc.keywordsNucleation (Physics)
dc.keywordsFailure
dc.keywordsSolder joints
dc.keywordsFlip-chip
dc.keywordsElectrodiffusion AND Current density
dc.treeJournal of Electronic Packaging:;2005:;volume( 127 ):;issue: 002
dc.contenttypeFulltext


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