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RISRapid Modeling of Photopolymerization in Projection Two-Photon Lithography Via an Operator Splitting Finite Difference Method
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: Two-photon lithography (TPL) is an attractive technique for nanoscale additive manufacturing of functional three-dimensional (3D) structures due to its ability to print subdiffraction features with light. Despite its ...