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    Residual Stresses for In-Situ Deposition of Thin-Film High-Temperature Superconductors 

    Source: Journal of Electronic Packaging:;1994:;volume( 116 ):;issue: 004:;page 249
    Author(s): P. E. Phelan; M. N. Ghasemi Nejhad
    Publisher: The American Society of Mechanical Engineers (ASME)
    Abstract: Residual stresses are caused by nonuniform thermal expansion and chemical shrinkage taking place during processing. For thin-film high-temperature superconductors, residual stresses result because ...
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