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contributor authorChakraborti, Anurag
contributor authorDas, Suman Kalyan
contributor authorSahoo, Prasanta
date accessioned2025-04-21T10:06:32Z
date available2025-04-21T10:06:32Z
date copyright12/12/2024 12:00:00 AM
date issued2024
identifier issn0742-4787
identifier othertrib_147_7_071401.pdf
identifier urihttp://yetl.yabesh.ir/yetl1/handle/yetl/4305512
description abstractThis study explores the influence of cobalt content on the tribomechanical and corrosion properties of Ni–Co–P coatings deposited through reverse pulse electroplating. The ratio of Co salt concentration to the total Ni and Co salt concentration was varied in the electrolyte to achieve different Co levels within relatively low cobalt (≤36 wt%) regime. X-ray diffraction revealed crystallite sizes of 1–3 nm in the deposited layers suggesting a mixture of amorphous and nanocrystalline structure. Critical loads in scratch adhesion tests are found to be in between 10.5 N and 15.1 N implying adequate adhesive bonding between the deposits and the substrates. Microhardness and pin-on-disc tribo test results demonstrate a positive correlation between Co content and both hardness and wear resistance of the coatings. However, incorporating small amounts of Co (≤6.2 wt%) exhibited minimal impact on these properties. Interestingly, corrosion resistance in saline medium peaked at the second-highest Co level (26.2 wt% of Co), followed by a decrease with further increase of Co. These findings indicate an optimal Co concentration for achieving a balance between wear resistance and corrosion protection in Ni–Co–P coatings.
publisherThe American Society of Mechanical Engineers (ASME)
titleTailoring the Tribomechanical and Corrosion Behavior of Reverse Pulse Deposited Ni–Co–P Coating Through Cobalt Content Modulation
typeJournal Paper
journal volume147
journal issue7
journal titleJournal of Tribology
identifier doi10.1115/1.4067283
journal fristpage71401-1
journal lastpage71401-15
page15
treeJournal of Tribology:;2024:;volume( 147 ):;issue: 007
contenttypeFulltext


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