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contributor authorYu, Hanjiang
contributor authorTan, Tianya
contributor authorWu, Wei
contributor authorTian, Chao
contributor authorAn, Ying
contributor authorSun, Fengjiu
date accessioned2017-05-09T01:00:27Z
date available2017-05-09T01:00:27Z
date issued2013
identifier issn1087-1357
identifier othermanu_135_3_034501.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/152357
description abstractThe molecular dynamics (MD) method is successfully applied to simulate the nitridation of titanium by the mixing technology with laser and plasma. Based on the simulation, the influence of the processing parameters, such as the laser power density and the scanning velocity on the effective thickness of the nitride layer, was investigated. It was found that, for each scanning velocity, there is a laser power density range within which the higher laser power density has the beneficial effect for nitriding treatment. Comparing the simulation and experimental results shows that the calculated results are in good qualitative agreement with the experimental results.
publisherThe American Society of Mechanical Engineers (ASME)
titleMolecular Dynamics Study of Laser and Plasma Nitriding of Titanium
typeJournal Paper
journal volume135
journal issue3
journal titleJournal of Manufacturing Science and Engineering
identifier doi10.1115/1.4023709
journal fristpage34501
journal lastpage34501
identifier eissn1528-8935
treeJournal of Manufacturing Science and Engineering:;2013:;volume( 135 ):;issue: 003
contenttypeFulltext


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