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contributor authorC. J. Fu
contributor authorW. C. Tan
date accessioned2017-05-09T00:33:54Z
date available2017-05-09T00:33:54Z
date copyrightMarch, 2009
date issued2009
identifier issn0022-1481
identifier otherJHTRAO-27857#033105_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/141105
description abstractWe propose in this work a structure of semiconductor thin films combined with a one-dimensional metallic grating, which allows for selective improvement of thermal radiative absorptivity (also emissivity) of the structure. Both shallow and deep gratings are considered in this work. Our numerical results obtained with a 2D rigorous coupled-wave analysis algorithm demonstrate that the proposed structure exhibits enhanced spectral absorptivity for photon energy slightly above the gap energy of the semiconductor (silicon in this work). Furthermore, the selectively improved absorptivity can be obtained in a wide range of incidence angles. As such, much smaller thickness of the semiconductor layer is required to absorb the same amount of high energy photons than in a conventional Si-based photovoltaic device. In addition, absorptivity for low energy photons in the new structure is lower due to the smaller semiconductor layer thickness. Therefore, the new structure may have potential applications in energy conversion devices.
publisherThe American Society of Mechanical Engineers (ASME)
titleSemiconductor Thin Films Combined With Metallic Grating for Selective Improvement of Thermal Radiative Absorption/Emission
typeJournal Paper
journal volume131
journal issue3
journal titleJournal of Heat Transfer
identifier doi10.1115/1.3056599
journal fristpage33105
identifier eissn1528-8943
keywordsThin films
keywordsDiffraction gratings
keywordsSemiconductors (Materials)
keywordsWaves
keywordsAbsorption AND Emissions
treeJournal of Heat Transfer:;2009:;volume( 131 ):;issue: 003
contenttypeFulltext


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