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contributor authorNoritaka Kawasegi
contributor authorNoboru Takano
contributor authorDaisuke Oka
contributor authorNoboru Morita
contributor authorKazutaka Kanda
contributor authorTsutomu Obata
contributor authorKiwamu Ashida
contributor authorShigeto Takano
contributor authorShigeru Yamada
date accessioned2017-05-09T00:20:43Z
date available2017-05-09T00:20:43Z
date copyrightAugust, 2006
date issued2006
identifier issn1087-1357
identifier otherJMSEFK-27953#723_1.pdf
identifier urihttp://yetl.yabesh.ir/yetl/handle/yetl/134144
description abstractThis paper investigates nanomachining of single-crystal silicon using an atomic force microscope with a diamond-tip cantilever. To enable nanomachining of silicon, a nanomachining cantilever with a pyramidal diamond tip was developed using a combination of photolithography and hot-filament chemical vapor deposition. Nanomachining experiments on silicon using the cantilever are demonstrated under various machining parameters. The silicon surface can be removed with a rate of several tens to hundreds of nanometers in ductile mode, and the cantilever shows superior wear resistance. The experiments demonstrate successful nanomachining of single-crystal silicon.
publisherThe American Society of Mechanical Engineers (ASME)
titleNanomachining of Silicon Surface Using Atomic Force Microscope With Diamond Tip
typeJournal Paper
journal volume128
journal issue3
journal titleJournal of Manufacturing Science and Engineering
identifier doi10.1115/1.2163364
journal fristpage723
journal lastpage729
identifier eissn1528-8935
keywordsMachining
keywordsAtomic force microscopy
keywordsCantilevers
keywordsDiamonds
keywordsSilicon
keywordsCrystals
keywordsCutting
keywordsWear AND Wear resistance
treeJournal of Manufacturing Science and Engineering:;2006:;volume( 128 ):;issue: 003
contenttypeFulltext


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