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RISStudy on the Deposition Profile Characteristics in the Micron-Scale Trench Using Direct Simulation Monte Carlo Method
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: As integrated circuits are advancing toward smaller device features, step-coverage in submicron trenches and holes in thin film deposition are becoming of concern. Deposition consists of gas flow ...
Direct Simulation Monte Carlo Analysis of Rarefied Gas Flow Structures and Ventilation of Etching Gas in Magneto-Microwave Plasma Etching Reactors
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: Gas flows in plasma etching reactors for semiconductor fabrication became a chief consideration in designing second-generation reactors with higher etching rates. An axisymmetrical model based on ...