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RISSearch for an Optimum in Thermal Systems and Processes
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: This paper considers the optimization of thermal systems and processes, which are of interest in a wide range of practical applications, on the basis of mathematical and numerical modeling as well as experimental data. ...
Thermal Issues in Materials Processing
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: This paper considers the thermal aspects that frequently arise in practical materials processing systems. Important issues such as feasibility, product quality, and production rate have a thermal basis in many cases and ...
Experimental Study of the Effect of Precursor Composition on the Microstructure of Gallium Nitride Thin Films Grown by the MOCVD Process
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: Chemical vapor deposition (CVD) is a widely used manufacturing process for obtaining thin films of materials like silicon, silicon carbide, graphene, and gallium nitride that are employed in the fabrication of electronic ...
The Effect of Carrier Gas and Reactor Pressure on Gallium Nitride Growth in MOCVD Manufacturing Process
Publisher: American Society of Mechanical Engineers (ASME)
Abstract: Gallium nitride (GaN) is an attractive material for manufacturing light emitting diodes and other electronic devices due to its wide band-gap and superb optoelectronic performance. The quality of GaN thin film determines ...
Numerical Simulation of GaN Growth in a Metalorganic Chemical Vapor Deposition Process
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: A detailed mathematical model for the growth of gallium nitride in a vertical impinging metalorganic chemical vapor deposition (MOCVD) reactor is developed first, and the complete chemical mechanisms are introduced. Then, ...
Influence of Precursor Concentration on Crystalline Quality of GaN Thin Films Grown on a Sapphire Wafer
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: Chemical vapor deposition (CVD), which involves chemical reactions in gases for deposition on a heated surface, is an extensively used manufacturing technique for obtaining thin films of materials like silicon, graphene, ...
Numerical Investigation on Natural Convection in Inclined Channels Partially Filled With Asymmetrically Heated Metal Foam
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: A numerical study on natural convection in an inclined channel partially filled with open metal foam is investigated in two-dimensional laminar and incompressible and steady-state condition. The upper wall is heated at ...
Manufacturing of Gallium Nitride Thin Films in a Multi-Wafer MOCVD Reactor
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: Gallium nitride (GaN) thin films have attracted considerable attention for manufacturing optical and electronic devices. They have wide bandgap and superb performance in these applications. The reliability and durability ...
A Numerical and Experimental Study on the Fabrication GaN Films by Chemical Vapor Deposition
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: Computational modeling and simulation are employed to study a rotating susceptor vertical impinging chemical vapor deposition (CVD) reactor to predict GaN film deposition. Many metal-organic chemical vapor deposition reactor ...
Design and Optimization of Multiple Microchannel Heat Transfer Systems
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: In this paper, two different configurations of multiple microchannel heat sinks, with fluid flow, are investigated for heat removal: straight and Ushaped channel designs. Numerical models are utilized to study the multiphysics ...