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Measurement of Biaxial Stress States in Silicon Using Micro-Raman Spectroscopy
Publisher: The American Society of Mechanical Engineers (ASME)
Abstract: Micro-Raman spectroscopy is used to determine the multiaxial stress state in silicon wafers using a strategy proposed by , (J. Appl. Phys.82, 2595–2602 (1997)) Previously, this strategy was ...
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